Enhance your career in Korean Law today by making the decision to achive a higher education in U.S. patent law with the White-Stavish Patent Training Institute. Click the arrow to review our process in becoming a stronger patent lawyer.
Register now for PTI’s world-renowned US Patent Bar Review Course tailored for Korean attorneys.
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Any Korean attorney with a technical degree in science or engineering, or the equivalent can take the U.S. Patent Bar Exam. We have helped many other Koreans in the past and we can help you.
Let PTI and its Sponsor law firm, Sherr & Vaughn, help you secure the proper VISA. Sherr & Vaughn has helped many Korean attorneys secure a J-1 Visa in order to study in the U.S. for the Patent Bar Exam and has teamed up with us to expedite that process.
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PTI’s Sponsor firm Sherr & Vaughn, will prepare and process the appropriate Visa for all eligible students to ensure compliance with U.S. immigration laws. Sherr & Vaughn is certified to issue the Visas necessary for you to attend PTI’s course.
Prepare for this exciting new opportunity in patent law by reviewing PTI’s Course Schedule. This will give you an idea of how your time will be spent in the U.S. and the intensity of the course.
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PTI’s proven steps to success on the Exam:
• Instructors with decades of experience
• Interactive software that replicates the exam
• Fully updated materials, lectures and questions
• Live lectures and one-on-one tutorials
Let us arrange all of your travel arrangements and living accommodations. PTI and its host firm, Sherr & Vaughn, will assist you with planning all of your travel plans and living arrangements in order to make your studying experience as pleasant and productive as possible.
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PTI and Sherr & Vaughn will work with each applicant to ensure a safe and comfortable trip to the United States, and to provide the very best living arrangements and conditions to study for the US Patent Bar Exam.
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Begin PTI’s two-month course including live lectures and bootcamp study schedule designed to guarantee you to pass the exam. PTI will provide more than 1500 practice exam questions with answers and review with live instructors to maximize your chance for success.
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When you attend our live course, from the very first hour you will benefit from our exam-focused approach. There is just one reason this is the essential U.S. Patent Bar Exam resource: It is simply the most user-friendly course available today.
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You will take the Patent Bar Exam at the end of your stay. Celebrate passing the US Patent Bar Exam with your co-applicants, and enjoy your enhanced career in patent law.
Patent Law is one of the world’s top growth industries with everchanging opportunities throughout Korea and the United States. By taking and passing the U.S. Patent Bar Exam you will gain the experience necessary to make your career in patent law successful and lucrative.
PTI’s Patent Bar Review Course is sponsored by the Practicing Law Institute, which remains the best way to prepare yourself to ace the test. When your future is riding on the results, you need a course that delivers. That’s what PLI has been doing for many YEARS longer than ANYONE else throughout the world.
Tailored specifically for Korean applicants with Korean faculty members.
In clear, concise, right-to-the-point language, this information-packed course leads you through the intricacies — and around the traps — of the Patent Bar Exam. You’ll get the hard facts, test-taking tips, sample questions and answers, and intense practice exams that mirror what you’re going to face when you sit down to take the real thing. PatWare and PatSim software almost exactly predicted the current format of the Exam by many years. PatWare and PatSim have now been expanded and updated to play an even more critical role in your preparation.
When you attend our live course, from the very first hour of the course, you’ll benefit from our Exam-focused approach. There’s just one reason this is the essential PTO exam resource: It is simply the most user-friendly, comprehensive, in-depth, authoritative and Exam-focused course available today.
Register to take PTI’s course now, even if you’re going to attend a live course at a later date. Advance preparation is key.
PTI’s Patent Bar Review Faculty Expert. Experienced. Exam-Focused.
Program Chair, Principal Lecturer, and Course Author/Editor Partner, Berenato & White, LLC PLI’s Director of Patent Professional Development Developer and Instructor, PTO’s “Patent Law and Evidence” course for patent examiners Adjunct Professor, John Marshall Law School (Chicago) Former Patent Examiner and Special Assistant to the Commissioner of Patents and Trademarks
"John White is a rock star!" - Katherine Jackson, University of Houston; Houston course 2008
President and Founder of Patent Training Institute, LLC. Partner, Berenato & White, LLC Original Instructor for PLI’s Patent Bar Review Course 20 years of experience with patent prosecution, litigation and client counseling Successfully argued before the CAFC and the Board of Patent Appeals and Interferences Former Patent Examiner "John and Matt have a talent for making patent law interesting and entertaining. A rare gift, to say the least." -- Brendan Jones, Foley Hoag LLP; Boston course 2008
Founder and Principal Lecturer, PassthePatent Bar.com Originator of the West Patent Bar Review Course Former Academic Director and as a primary lecturer for the PLI Patent Bar Review course. PRG’s Patent Bar Review course (1987-1994) PRG’s Advanced Patent Prosecution and Preparation Course (1976-1993). Former Partner, Cushman, Darby & Cushman, now Pillsbury & Winthrop, 1967, -1989; Longacre & White, 1989-1999. Education: BS, Electrical Engineering, Ohio State University; JD, Georgetown University Law Center.
PLI’s Patent Bar Review is co-sponsored by some of the top IP law schools and organizations in the nation: George Washington University Law School, John Marshall Law School (Chicago), Santa Clara University School of Law – High Tech Law Institute, Suffolk University Law School and The Intellectual Property & Technology Law Society of South Texas College of Law.